Features of SiO[2] reactive-ion etching kinetics in CF[4]+ Ar + O[2] and C[4]F[8] + Ar + O[2] gas mixtures
Efremov, A. M., Kwang-Ho Kwon, Sobolev, A. M.
Features of SiO[2] reactive-ion etching kinetics in CF[4]+ Ar + O[2] and C[4]F[8] + Ar + O[2] gas mixtures, A. M. Efremov, A. M. Sobolev, Kwang-Ho Kwon
3 рис., 1 табл.
// Известия вузов. Химия и химическая технология .-
2020 .-
Т. 63, вып. 9. - С. 21-27 .-
